Desarrollo de patrones biofuncionales sobre Si y Tin mediante haces de iones

Abstract

ABSTRACT The recent breakthrough in Biomedicine implies an intrinsically interdisciplinary approach. In this context, science and technology of surfaces opens new opportunities to exploit the biomaterials potential. The possibility to selectively modify the surface, by chemical or topographic patterns, allows controlling factors that govern cell behavior in contact with the biomaterial. In this work, the use of biofunctional patterns on Si and TiN as platforms to study cell response is presented. To obtain such patterns ion implantation through metallic masks has been used as main tool, following two differentiated strategies. The Si/PSi patterns have been obtained by the MeV implantation process, which inhibits PSi formation at irradiated areas, followed by an electrochemical etching. In order to obtain the TiN/TiNO patterns the incorporation of keV oxygen ions at surface level has been employed. Both types of patterns have been optimized, studying composition, structure and morphology, paying special attention to the implantation effects. The obtained patterns have allowed controlling the response of human mesenchymal cells varying the pattern dimensions, in the case of Si/PSi, or by means of applied external potentials in the case of TiN/TiNO.