Effect of substrate temperature in SiOxNy films deposited by electron cyclotron resonance
- Del Prado, A.
- Martínez, F.L.
- Mártil, I.
- González-Díaz, G.
- Fernández, M.
ISSN: 0734-2101
Année de publication: 1999
Volumen: 17
Número: 4
Pages: 1263-1268
Type: Article