Interfacial properties of HfO2/SiN/Si gate structures
- Toledano-Luque, M.
- Del Prado, A.
- Feijoo, P.C.
- Amezaga, A.
- Andrés, E.S.
- Lucía, M.L.
Proceedings:
Proceedings of the 2009 Spanish Conference on Electron Devices, CDE'09
ISBN: 9781424428397
Year of publication: 2009
Pages: 23-26
Type: Conference paper