Hafnium oxide thin films deposited by high pressure reactive sputtering in atmosphere formed with different Ar/O2 ratios

  1. Toledano-Luque, M.
  2. San Andrés, E.
  3. Olea, J.
  4. del Prado, A.
  5. Mártil, I.
  6. Bohne, W.
  7. Röhrich, J.
  8. Strub, E.
Journal:
Materials Science in Semiconductor Processing

ISSN: 1369-8001

Year of publication: 2006

Volume: 9

Issue: 6

Pages: 1020-1024

Type: Article

DOI: 10.1016/J.MSSP.2006.10.018 GOOGLE SCHOLAR
Data source: Scopus