Physical properties of high pressure reactively sputtered TiO2

  1. San Andrés, E.
  2. Toledano-Luque, M.
  3. Del Prado, A.
  4. Navacerrada, M.A.
  5. Mártil, I.
  6. González-Díaz, G.
  7. Bohne, W.
  8. Röhrich, J.
  9. Strub, E.
Journal:
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

ISSN: 0734-2101

Year of publication: 2005

Volume: 23

Issue: 6

Pages: 1523-1530

Type: Article

DOI: 10.1116/1.2056554 GOOGLE SCHOLAR
Data source: Scopus