Rapid thermal annealing effects on plasma deposited SiOx:H films

  1. San Andrés, E.
  2. Del Prado, A.
  3. Mártil, I.
  4. González Díaz, G.
  5. Martinez, F.L.
  6. Bravo, D.
  7. López, F.J.
Journal:
Vacuum

ISSN: 0042-207X

Year of publication: 2002

Volume: 67

Issue: 3-4

Pages: 531-536

Type: Conference paper

DOI: 10.1016/S0042-207X(02)00244-0 GOOGLE SCHOLAR
Data source: Scopus