Electrical characterization of low nitrogen content plasma deposited and rapid thermal annealed Al/SiNx:H/InP metal-insulator-semiconductor structures
- Castán, H.
- Dueñas, S.
- Barbolla, J.
- Redondo, E.
- Mártil, I.
- González-Díaz, G.
ISSN: 0021-4922
Année de publication: 2000
Volumen: 39
Número: 11
Pages: 6212-6215
Type: Article