Electrical characterization of electron cyclotron resonance deposited silicon nitride dual layer for enhanced AI/SiNx:H/InP metal-insulator-semiconductor structures fabrication

1. Peláez, R.
2. Castán, E.
3. Dueñas, S.
4. Barbolla, J.
5. Redondo, E.
6. Mártil, I.
7. González-Díaz, G.