Photoassisted immersion deposition of cu clusters onto porous silicon: A Langmuir-Hill Ligand-locus model applied to the growth kinetics

  1. Recio, G.
  2. Gallach, D.
  3. Manso Silván, M.
  4. Fukami, K.
  5. Martín Palma, R.J.
  6. Castro, G.R.
  7. Muñoz-Noval, A.
Aldizkaria:
Journal of Physical Chemistry C

ISSN: 1932-7455 1932-7447

Argitalpen urtea: 2014

Alea: 118

Zenbakia: 27

Orrialdeak: 14905-14912

Mota: Artikulua

DOI: 10.1021/JP502108B GOOGLE SCHOLAR