Trapping in 1nm EOT high-k/MG

  1. Zahid, M. B.
  2. Pantisano, L.
  3. Degraeve, R.
  4. Aoulaiche, M.
  5. Trojman, L.
  6. Ferain, I.
  7. San Andres, E.
  8. Shickova, A.
  9. O'Connor, R.
  10. Groeseneken, G.
  11. Heyns, M.
  12. De Gendt, S.
Book Series:
PHYSICS AND TECHNOLOGY OF HIGH-K GATE DIELECTRICS 6
  1. Kar, S (coord.)
  2. Landheer, D (coord.)
  3. Houssa, M (coord.)
  4. Misra, D (coord.)
  5. VanElshocht, S (coord.)
  6. Iwai, H (coord.)

ISSN: 1938-5862,  1938-6737

ISBN: 978-1-56677-651-6

Year of publication: 2008

Volume: 16

Issue: 5

Pages: 77-78

Congress: 5th International Symposium on High Dielectric Constant Materials and Gate Stacks held at the 214th Meeting of the Electrochemical-Society

Type: Conference paper

DOI: 10.1149/1.2981589 GOOGLE SCHOLAR
Data source: WoS