Fabrication of TiOx, by High Pressure Sputtering for Selective Contact in Photovoltaic Cells
- Zenteno, Francisco José Pérez
- Serrano, Enrique San Andrés 12
- Hemme, Eric García 12
- Gutiérrez, Daniel Caudevilla 12
- Cano, Sebastian Duarte
- García-Hernansanz, Rodrigo 12
- Algaidy, Sari
- Ariza, Javier Olea 12
- Pastor, David Pastor 12
- del Prado, Álvaro 12
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1
Universidad Complutense de Madrid
info
- 2 Departamento de Estructura de la Materia, Física Térmica y Electrónica
Año de publicación: 2023
Congreso: 2023 14th Spanish Conference on Electron Devices (CDE), 6-8 June 2023
Tipo: Aportación congreso
Resumen
In this work we have studied the behavior of TiO x growth by the unconventional technique of High-Pressure Sputtering (HPS) as an electron selective contact (ESC). This technique shows promising aspects for low-damage and low-temperature deposition, which are relevant criteria for the fabrication of heterojunction solar cells. We explored the deposition of TiO x with a 2-step process. First a thin Ti film is deposited in an Ar atmosphere, immediately the film is oxidized with the aid of an Ar/O 2 plasma at a relatively low temperature (150°C or 200°C). We analyzed the deposited films with XPS, FTIR and TEM measurements. Finally, Cox & Strack (C&S) structures were fabricated to obtain the specific contact resistance of TiOx/c-Si, with this data we compared different deposition processes.
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