High Pressure Sputtering of Mo Targets in Mixed Ar/O2/H2Atmospheres for Hole Selective Contacts in Photovoltaic Cells
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Zenteno, Francisco José Pérez
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Serrano, Enrique San Andrés
12
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Hemme, Eric García
12
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Torres, Ignacio
3
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Barrio, Rocío
3
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Gutiérrez, Daniel Caudevilla
12
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Cano, Sebastian Duarte
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García-Hernansanz, Rodrigo
12
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Ariza, Javier Olea
12
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Pastor, David Pastor
12
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Del Prado, Alvaro
12
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1
Universidad Complutense de Madrid
info
- 2 Departamento de Estructura de la Materia, Física Térmica y Electrónica
- 3 Unidad de Energía Solar Fotovoltaica, CIEMAT, Madrid, Spain
Editorial: IEEE
Año de publicación: 2023
Congreso: 2023 14th Spanish Conference on Electron Devices (CDE), 6-8 June 2023
Tipo: Aportación congreso
Resumen
We have deposited thin films of MoO x using high-pressure sputtering (HPS) and Ar/O 2 /H 2 atmospheres aiming at the compositional and interface control. We found that H2 impacts plasma composition, which in turn produces a reduction of the oxygen content and a change in the refractive index of the films. However, the presence of hydrogen in the plasma atmosphere enhances interfacial SiO x regrowth, as FTIR shows. TEM measurements show that this regrowth is not critical for thin films. Also, increasing the hydrogen ratio produces a change from amorphous to an amorphous/polycrystalline mixture. Lifetime measurements show that these films are adequate for their integration into test HIT -like structures, but require more work to produce competitive iVoc values.
Referencias bibliográficas
- 10.1063/1.1495068
- 10.1016/j.materresbull.2017.09.005
- 10.1063/1.4764529
- 10.1063/1.1626798
- 10.1063/1.1800011
- 10.1021/acsenergylett.7b01279
- 10.1109/PVSC43889.2021.9518553
- 10.1116/1.2056554
- gaydon, (0), The Identification of Molecular Spectra
- 10.1016/j.mssp.2006.10.018
- 10.1016/j.surfin.2021.101687
- 10.1016/j.mssp.2021.106189