High-pressure sputtering deposition and in situ plasma oxidation of TiOx thin films as electron selective contact for photovoltaic applications

  1. Pérez-Zenteno, F.
  2. García-Hemme, E.
  3. Torres, I.
  4. Barrio, R.
  5. Duarte, S.
  6. Benítez-Fernández, R.
  7. Caudevilla, D.
  8. García-Hernansanz, R.
  9. Olea, J.
  10. Pastor, D.
  11. Prado, A.D.
  12. San Andrés, E.
Revista:
Materials Science in Semiconductor Processing

ISSN: 1369-8001

Any de publicació: 2025

Volum: 186

Tipus: Article

DOI: 10.1016/J.MSSP.2024.109038 GOOGLE SCHOLAR lock_openAccés obert editor
Font de les dades: Scopus