Ultrasensitive non-chemically amplified low-contrast negative electron beam lithography resist with dual-tone behaviour

1. Canalejas-Tejero, V.
2. Carrasco, S.
3. Navarro-Villoslada, F.
4. García Fierro, J.L.
5. Capel-Sánchez, M.D.C.
6. Moreno-Bondi, M.C.
7. Barrios, C.A.