Ultrasensitive non-chemically amplified low-contrast negative electron beam lithography resist with dual-tone behaviour

  1. Canalejas-Tejero, V.
  2. Carrasco, S.
  3. Navarro-Villoslada, F.
  4. García Fierro, J.L.
  5. Capel-Sánchez, M.D.C.
  6. Moreno-Bondi, M.C.
  7. Barrios, C.A.
Aldizkaria:
Journal of Materials Chemistry C

ISSN: 2050-7526,  2050-7534

Argitalpen urtea: 2013

Alea: 1

Zenbakia: 7

Orrialdeak: 1392-1398

Mota: Artikulua

DOI: 10.1039/C2TC00148A GOOGLE SCHOLAR
Datuen iturria: Scopus