Reactive deposition of device quality conformal copper films from supercritical CO2

  1. Blackburn, J.M.
  2. Cabanas, A.
  3. Zong, Y.
  4. Quinn, J.D.
  5. Watkins, J.J.
Actes de conférence:
Advanced Metallization Conference (AMC)

ISSN: 1048-0854

Année de publication: 2001

Pages: 177-183

Type: Communication dans un congrès