Depth profiling of ion-implanted AlInN using time-of-flight secondary ion mass spectrometry and cathodoluminescence

1. Martin, R.W.
2. Rading, D.
3. Kersting, R.
4. Tallarek, E.
5. Nogales, E.
6. Amabile, D.
7. Wang, K.
8. Katchkanov, V.
9. Trager-Cowan, C.
10. O'Donnell, K.P.
11. Watson, I.M.
12. Matias, V.
13. Vantomme, A.
14. Lorenz, K.
15. Alves, E.