Epitaxial n++-InGaAs ultra-shallow junctions for highly scaled n-MOS devices

  1. Tejedor, P.
  2. Drescher, M.
  3. Vázquez, L.
  4. Wilde, L.
Aldizkaria:
Applied Surface Science

ISSN: 0169-4332

Argitalpen urtea: 2019

Alea: 496

Mota: Artikulua

DOI: 10.1016/J.APSUSC.2019.143721 GOOGLE SCHOLAR