Anomalous thermal oxidation of gadolinium thin films deposited on silicon by high pressure sputtering

  1. Pampillón, M.A.
  2. Feijoo, P.C.
  3. San Andrés, E.
  4. Lucía, M.L.
  5. Del Prado, A.
  6. Toledano-Luque, M.
Revue:
Microelectronic Engineering

ISSN: 0167-9317

Année de publication: 2011

Volumen: 88

Número: 9

Pages: 2991-2996

Type: Article

DOI: 10.1016/J.MEE.2011.04.058 GOOGLE SCHOLAR
La source de données: Scopus