Bonding structure and hydrogen content in silicon nitride thin films deposited by the electron cyclotron resonance plasma method

1. Martínez, F.L.
2. Ruiz-Merino, R.
3. Del Prado, A.
4. San Andrés, E.
5. Mártil, I.
6. González-Díaz, G.
7. Jeynes, C.
8. Barradas, N.P.
9. Wang, L.
10. Reehal, H.S.