Characterization of nitrogen-rich silicon nitride films grown by the electron cyclotron resonance plasma technique

  1. Wang, L.
  2. Reehal, H.S.
  3. Martínez, F.L.
  4. San Andrés, E.
  5. Del Prado, A.
Aldizkaria:
Semiconductor Science and Technology

ISSN: 0268-1242

Argitalpen urtea: 2003

Alea: 18

Zenbakia: 7

Orrialdeak: 633-641

Mota: Artikulua

DOI: 10.1088/0268-1242/18/7/306 GOOGLE SCHOLAR
Datuen iturria: Scopus