Interface quality of high-pressure reactive sputtered and atomic layer deposited titanium oxide thin films on silicon

1. Dueñas, S.
2. Castán, H.
3. García, H.
4. Barbolla, J.
5. Andrés, E.S.
6. Mártil, I.
7. González-Díaz, G.
8. Kukli, K.
9. Aarik, J.