A comparative study of the electrical properties of TiO<sub>2</sub>films grown by high-pressure reactive sputtering and atomic layer deposition
- Dueñas, S
- Castán, H
- García, H
- San Andrés Serrano, Enrique 1
- Toledano-Luque, M
- Mártil de la Plaza, Ignacio 1
- González-Díaz, Germán 1
- Kukli, K
- Uustare, T
- Aarik, J
-
1
Universidad Complutense de Madrid
info
ISSN: 0268-1242, 1361-6641
Année de publication: 2005
Volumen: 20
Número: 10
Pages: 1044-1051
Type: Article
D'autres publications dans: Semiconductor Science and Technology
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