Effect of oxygen partial pressure on the NTCR characteristics of sputtered NixMn3-xO4+δ thin films

  1. Basu, A.
  2. Brinkman, A.W.
  3. Schmidt, R.
Journal:
Journal of the European Ceramic Society

ISSN: 0955-2219

Year of publication: 2004

Volume: 24

Issue: 6

Pages: 1247-1250

Type: Article

DOI: 10.1016/S0955-2219(03)00380-7 GOOGLE SCHOLAR
Data source: Scopus