Dielectric properties of anodic films formed on sputtering-deposited tantalum in phosphoric acid solution

  1. Lu, Q.
  2. Mato, S.
  3. Skeldon, P.
  4. Thompson, G.E.
  5. Masheder, D.
Aldizkaria:
Thin Solid Films

ISSN: 0040-6090

Argitalpen urtea: 2003

Alea: 429

Zenbakia: 1-2

Orrialdeak: 238-242

Mota: Artikulua

DOI: 10.1016/S0040-6090(02)01292-0 GOOGLE SCHOLAR