Electrical characterization of MIS capacitors fabricated from ECR-PECVD silicon oxide and silicon nitride bilayer films

  1. Castán, H.
  2. Dueñas, S.
  3. Barbolla, J.
  4. San Andrés, E.
  5. Del Prado, A.
  6. Mártil, I.
  7. González-Díaz, G.
Journal:
Journal of Materials Science: Materials in Electronics

ISSN: 0957-4522

Year of publication: 2003

Volume: 14

Issue: 5-7

Pages: 287-290

Type: Article

DOI: 10.1023/A:1023907508286 GOOGLE SCHOLAR
Data source: Scopus