High quality Ti-implanted Si layers above the Mott limit

  1. Olea, J.
  2. Toledano-Luque, M.
  3. Pastor, D.
  4. San-Andrés, E.
  5. Mártil, I.
  6. González-Díaz, G.
Journal:
Journal of Applied Physics

ISSN: 0021-8979

Year of publication: 2010

Volume: 107

Issue: 10

Type: Article

DOI: 10.1063/1.3391274 GOOGLE SCHOLAR
Data source: Scopus