Influence of rapid thermal annealing processes on the properties of SiNx:H films deposited by the electron cyclotron resonance method

  1. Martínez, F.L.
  2. Mártil, I.
  3. González-Díaz, G.
  4. Selle, B.
  5. Sieber, I.
Aldizkaria:
Journal of Non-Crystalline Solids

ISSN: 0022-3093

Argitalpen urtea: 1998

Alea: 227-230

Zenbakia: PART 1

Orrialdeak: 523-527

Mota: Artikulua

DOI: 10.1016/S0022-3093(98)00092-1 GOOGLE SCHOLAR
Datuen iturria: Scopus