Depth profile study of Ti implanted Si at very high doses
- Olea, J.
- Pastor, D.
- Toledano-Luque, M.
- Mártil, I.
- Gonzlez-Daz, G.
Revue:
Journal of Applied Physics
ISSN: 0021-8979
Année de publication: 2011
Volumen: 110
Número: 6
Type: Article