Influence of the target and working gas on the composition of silicon nitride thin films prepared by reactive RF-sputtering

  1. Vila, M.
  2. Prieto, C.
  3. García-López, J.
  4. Respaldiza, M.A.
Zeitschrift:
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

ISSN: 0168-583X

Datum der Publikation: 2003

Ausgabe: 211

Nummer: 2

Seiten: 199-205

Art: Artikel

DOI: 10.1016/S0168-583X(03)01211-4 GOOGLE SCHOLAR
Datenquelle: Scopus