Line width dependent mobility in high-k - a comparative performance study between FUSI and TiN

  1. Pantisano, L.
  2. Trojman, L.
  3. Severi, S.
  4. San Andres, E.
  5. Kerner, C.
  6. Veloso, A.
  7. Ferain, I.
  8. Hoffman, T.
  9. Groeseneken, G.
  10. De Gendt, S.
Liburua:
2007 INTERNATIONAL SYMPOSIUM ON VLSI TECHNOLOGY, SYSTEMS AND APPLICATIONS (VLSI-TSA), PROCEEDINGS OF TECHNICAL PAPERS

ISBN: 978-1-4244-0584-8

Argitalpen urtea: 2007

Orrialdeak: 38-39

Biltzarra: International Symposium on VLSI Technology, Systems and Applications

Mota: Biltzar ekarpena

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Datuen iturria: WoS