2005

1. A comparative study of the electrical properties of TiO2 films grown by high-pressure reactive sputtering and atomic layer deposition

   Semiconductor Science and Technology, Vol. 20, Núm. 10, pp. 1044-1051

2. Interface quality of high-pressure reactive sputtered and atomic layer deposited titanium oxide thin films on silicon

   2005 Spanish Conference on Electron Devices, Proceedings