Influence of H on the composition and atomic concentrations of "N-rich" plasma deposited SiOxNyHz films

  1. Del Prado, A.
  2. Andrés, E.S.
  3. Mártil, I.
  4. González-Díaz, G.
  5. Bohne, W.
  6. Röhrich, J.
  7. Selle, B.
Revue:
Journal of Applied Physics

ISSN: 0021-8979

Année de publication: 2004

Volumen: 95

Número: 10

Pages: 5373-5382

Type: Article

DOI: 10.1063/1.1699525 GOOGLE SCHOLAR lock_openAccès ouvert editor
La source de données: Scopus