Effect of sputtering rate and ion irradiation on the microstructure and magnetic properties of Ni Si3 N4 multilayers

  1. Vila, M.
  2. Prieto, C.
  3. Traverse, A.
  4. Ramírez, R.
Aldizkaria:
Journal of Applied Physics

ISSN: 0021-8979

Argitalpen urtea: 2005

Alea: 98

Zenbakia: 11

Mota: Artikulua

DOI: 10.1063/1.2137882 GOOGLE SCHOLAR