Effect of sputtering rate and ion irradiation on the microstructure and magnetic properties of Ni Si3 N4 multilayers

  1. Vila, M.
  2. Prieto, C.
  3. Traverse, A.
  4. Ramírez, R.
Revue:
Journal of Applied Physics

ISSN: 0021-8979

Année de publication: 2005

Volumen: 98

Número: 11

Type: Article

DOI: 10.1063/1.2137882 GOOGLE SCHOLAR