Effect of sputtering rate and ion irradiation on the microstructure and magnetic properties of Ni Si3 N4 multilayers

  1. Vila, M.
  2. Prieto, C.
  3. Traverse, A.
  4. Ramírez, R.
Revista:
Journal of Applied Physics

ISSN: 0021-8979

Ano de publicación: 2005

Volume: 98

Número: 11

Tipo: Artigo

DOI: 10.1063/1.2137882 GOOGLE SCHOLAR