Mª Angela Pampillon Arce-rekin lankidetzan egindako argitalpenak (6)

2014

  1. High pressure sputtering for kigh-k dielectric deposition. Is it worth trying?

    ECS Transactions

2013

  1. High pressure sputtering as a viable technique for future high permittivity dielectric on III-V integration: GdOx on InP demonstration

    Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, Vol. 31, Núm. 1

  2. Towards high-k integration with III-V channels: Interface optimization of high pressure sputtered gadolinium oxide on indium phospide

    Proceedings of the 2013 Spanish Conference on Electron Devices, CDE 2013

2011

  1. Anomalous thermal oxidation of gadolinium thin films deposited on silicon by high pressure sputtering

    Microelectronic Engineering, Vol. 88, Núm. 9, pp. 2991-2996

  2. Interface engineering by metal electrode scavenging of Gd2O 3 films sputtered on Si

    Proceedings of the 8th Spanish Conference on Electron Devices, CDE'2011

  3. Towards metal electrode interface scavenging of rare-earth scandates: A Sc2O3 and Gd2O3 study

    Microelectronic Engineering