Rapid thermal annealing effects on the structural properties and density of defects in SiO2 and SiNx: H films deposited by electron cyclotron resonance

1. San Andrés, E.
2. Del Prado, A.
3. Martínez, F.L.
4. Mártil, I.
5. Bravo, D.
6. López, F.J.