Compositional analysis of SiOxNy:H films by heavy-ion ERDA: The problem of radiation damage

  1. Bohne, W.
  2. Fuhs, W.
  3. Röhrich, J.
  4. Selle, B.
  5. Sieber, I.
  6. Del Prado, A.
  7. San Andrés, E.
  8. Mártil, I.
  9. González-Díaz, G.
Revue:
Surface and Interface Analysis

ISSN: 0142-2421

Année de publication: 2002

Volumen: 34

Número: 1

Pages: 749-753

Type: Communication dans un congrès

DOI: 10.1002/SIA.1403 GOOGLE SCHOLAR
La source de données: Scopus