IGNACIO
MARTIL DE LA PLAZA
Catedrático de universidad
David
Bravo Roldán
Publicacions en què col·labora amb David Bravo Roldán (11)
2003
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Bonding configuration and density of defects of SiOxH y thin films deposited by the electron cyclotron resonance plasma method
Journal of Applied Physics, Vol. 94, Núm. 12, pp. 7462-7469
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Microstructural modifications induced by rapid thermal annealing in plasma deposited SiOxNyHz films
Journal of Applied Physics, Vol. 94, Núm. 2, pp. 1019-1029
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Optical and structural properties of SiOxNyHz films deposited by electron cyclotron resonance and their correlation with composition
Journal of Applied Physics, Vol. 93, Núm. 11, pp. 8930-8938
2002
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Physical properties of plasma deposited SiOx thin films
Vacuum
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Rapid thermal annealing effects on plasma deposited SiOx:H films
Vacuum
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Thermally induced modifications on bonding configuration and density of defects of plasma deposited SiO x:H films
Journal of Applied Physics, Vol. 92, Núm. 4, pp. 1906-1913
2001
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Temperature effects on the electrical properties and structure of interfacial and bulk defects in Al/SiNx:H/Si devices
Journal of Applied Physics, Vol. 90, Núm. 3, pp. 1573-1581
2000
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Defect structure of SiNx:H films and its evolution with annealing temperature
Journal of Applied Physics, Vol. 88, Núm. 4, pp. 2149-2151
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Rapid thermal annealing effects on the structural properties and density of defects in SiO2 and SiNx: H films deposited by electron cyclotron resonance
Journal of Applied Physics, Vol. 87, Núm. 3, pp. 1187-1192
1999
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Thermal stability of a-SiNx:H films deposited by plasma electron cyclotron resonance
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 17, Núm. 4, pp. 1280-1284
1995
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Role of oxygen on the dangling bond configuration of low oxygen content SiNx:H films deposited at room temperature
Applied Physics Letters, Vol. 67, pp. 3263